Optics: measuring and testing – By alignment in lateral direction
Reexamination Certificate
2005-02-01
2005-02-01
Stafira, Michael P. (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
Reexamination Certificate
active
06850327
ABSTRACT:
A reference mark is formed on an under-surface of a reference mark member that is disposed on a mask stage. The mask stage can be part of a projection exposure apparatus in which a substrate and a mask are moved in respective scanning directions during scanning exposure. The projection exposure apparatus also may include a projection system disposed under the mask stage, with the mask and substrate being provided on opposite sides of projection system. The mask stage may be moved into the image field of the projection system, and the reference mark is detected.
REFERENCES:
patent: 4629313 (1986-12-01), Tammoto
patent: 4657379 (1987-04-01), Suwa
patent: 4666273 (1987-05-01), Shimizu et al.
patent: 4780615 (1988-10-01), Suzuki
patent: 4829193 (1989-05-01), Nishi
patent: 4871237 (1989-10-01), Anzai et al.
patent: 4880310 (1989-11-01), Nishi
patent: 4897553 (1990-01-01), Nishi
patent: 4943733 (1990-07-01), Mori et al.
patent: 5204535 (1993-04-01), Mizutani
patent: 5214489 (1993-05-01), Mizutani et al.
patent: 5243195 (1993-09-01), Nishi
patent: 5406373 (1995-04-01), Kamon
patent: 5408320 (1995-04-01), Katagiri et al.
patent: 5414514 (1995-05-01), Smith et al.
patent: 5506684 (1996-04-01), Ota et al.
patent: 5528027 (1996-06-01), Mizutani
patent: 5646413 (1997-07-01), Nishi
patent: 5661546 (1997-08-01), Taniguchi
patent: 5793472 (1998-08-01), Hori et al.
patent: 6018384 (2000-01-01), Ota
patent: 6151122 (2000-11-01), Taniguchi et al.
patent: 6169602 (2001-01-01), Taniguchi et al.
patent: 6198527 (2001-03-01), Nishi
patent: 6236448 (2001-05-01), Ota
patent: 6249336 (2001-06-01), Ota
patent: 6388735 (2002-05-01), Ota
patent: A-58-8353 (1983-01-01), None
patent: A-59-94032 (1984-05-01), None
patent: A-60-18738 (1985-01-01), None
patent: A-60-28613 (1985-02-01), None
patent: A-60-78457 (1985-05-01), None
patent: A-62-200724 (1987-09-01), None
patent: A-63-81818 (1988-04-01), None
Taniguchi Tetsuo
Tsuji Toshihiko
Nikon Corporation
Oliff & Berridg,e PLC
Stafira Michael P.
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