Inspection method and apparatus for projection optical systems

Details Inspection method and apparatus for projection optical systems Inspection method and apparatus for projection optical systems

1999-06-14

2000-11-21

Font, Frank G.

Optics: measuring and testing

By alignment in lateral direction

G01B 1100

Patent

active

061511226

ABSTRACT:
The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.

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