Inspection method and apparatus for a mask pattern used in semic

Details Inspection method and apparatus for a mask pattern used in semic Inspection method and apparatus for a mask pattern used in semic

1984-09-10

1987-02-03

Birmiel, Howard A.

Image analysis

Histogram processing

For setting a threshold

358101, 358106, 356390, 156627, G06K 900, G06K 960

Patent

active

046413537

ABSTRACT:
An inspection method and apparatus for a mask pattern such as a reticle pattern used in the fabrication of a semiconductor device is disclosed. The mask pattern is inspected by an imaging sensor mounted on a stage on which a fabricated object is also mounted. The imaging sensor converts an optical image of the mask pattern which is intended to be exposed on the object to a video signal and it is inspected by comparing it with another video signal provided from data for designing the mask pattern. This inspection is made before the process of exposing the mask pattern on the fabricated object in order to avoid a waste of time in the semiconductor pattern process.

REFERENCES:
patent: 4472738 (1984-09-01), Hada et al.
patent: 4532650 (1985-07-01), Wihl et al.
patent: 4542404 (1985-09-01), Duschl
patent: 4555798 (1985-11-01), Broadbent, Jr. et al.

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