Inspection interferometer with scanning autofocus, and phase ang

Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrometer

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356345, 356359, G01B 902

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active

054692598

ABSTRACT:
An inteferometer is provided with a light source forming a first collimated beam shaped to illuminate an area and a second collimated beam shaped to illuminate a narrow line. Both of these beams are split into orthogonally-polarized sub-beams, which are diverted outward and inward within a compound Wollastom prism. The images of these beams are focussed on a test surface through an objective lens, with a real splitting point being projected to the rear focal plane of the objective lens. With light reflected off the test surface and projected back through the compound Wollastom prism, interference patterns are generated on the surface of a line sensor, which is typically used with illuminated narrow lines split by the compound prism and projected onto a moving test surface, and on the surface of an area sensor, which is typically used with area illumination projected onto a stationary test surface. Autofocus and automatic phase angle correction servomechanisms are also provided within the interferometer.

REFERENCES:
patent: 3849003 (1974-11-01), Velzel
patent: 4298283 (1981-11-01), Makosch et al.
patent: 4320973 (1982-03-01), Fortunato et al.
patent: 4534649 (1982-08-01), Downs
patent: 4714348 (1987-12-01), Makosch
patent: 4844616 (1989-07-01), Kulkarni et al.
patent: 5122648 (1992-06-01), Cohen et al.
Korth et al, "Analyzing Optical Phase Structures," IBM Tech. Disclosure Bulletin, vol. 24, No. 6, Dec. 1981, pp. 3094-3095.
Makosch; "System for Stepless Beam Splitting," IBM Tech. Disclosure Bulletin, vol. 30, No. 11, Apr. 1988, pp. 249-250.
Frank-Schmidt et al, "Interferometric Method of Checking the Overlay Accuracy in Photolithographic Exposure Processes," IBM Tech. Disclosure Bulletin, vol. 32, No. 10B, Feb. 1990, pp. 214-217.
Bayer et al, "Photolithographic Process Control by Optical Phase Monitoring of Latent Images in Photoresist," IBM Tech. Disclosure Bulletin; vol. 34, No. 10A, Mar. 1992, pp. 140-143.

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