Inspection device and inspection method for pattern profile,...

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

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C356S237200

Reexamination Certificate

active

10497053

ABSTRACT:
Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern32is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate30on which a pattern is mounted, light sources40, 42and44which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors52and54which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.

REFERENCES:
patent: 5046847 (1991-09-01), Nakata et al.
patent: 5724132 (1998-03-01), Morishige et al.
patent: 6501545 (2002-12-01), Komuro et al.
patent: 6774991 (2004-08-01), Danko
patent: 63-305512 (1988-12-01), None
patent: 10325805 (1998-12-01), None
patent: 11051874 (1999-02-01), None

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