Image analysis – Applications – Manufacturing or product inspection
Patent
1992-06-30
1998-11-24
Boudreau, Leo
Image analysis
Applications
Manufacturing or product inspection
382149, 348126, G06K 900
Patent
active
058418938
ABSTRACT:
The present invention provides data analysis stations respectively for a probing tester and an automatic particle inspection machine. And, in the data analysis station, the coordinates on which the disposition of the chips are described on a product basis are equal to those on which the locations of the defects are described. Further, the station provides a function of determining which of the chips each defect belongs to. These data analysis stations are connected through a communication line. The present invention is capable of analyzing the data on a chip basis, resulting in being able to grasp the relation between how the defects are caused on each chip and the product character of the chip.
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"IS-2000 Patterned Wafer System Inspection System" by Hitachi, Ltd.
Ebara Yutaka
Hanashima Shuichi
Hashimoto Taizo
Ishikawa Seiji
Matsuoka Kazuhiko
Boudreau Leo
Hitachi , Ltd.
Mehta Bhavesh
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