Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2011-08-16
2011-08-16
Toatley, Gregory J (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237400, C356S511000
Reexamination Certificate
active
07999932
ABSTRACT:
An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.
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Imai Eiji
Mohara Yukihisa
Yamashita Hiroyuki
Hitachi High-Technologies Corporation
Miles & Stockbridge P.C.
Toatley Gregory J
Underwood Jarreas C
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