Insitu detection of tube sagging in semiconductor diffusion furn

Details Insitu detection of tube sagging in semiconductor diffusion furn Insitu detection of tube sagging in semiconductor diffusion furn

1994-09-16

1996-04-02

Westin, Edward P.

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

2502221, 356375, G01N 2186

Patent

active

055043461

ABSTRACT:
Semiconductor wafers are processed in a semiconductor diffusion furnace. During processing, the semiconductor wafers are placed in a quartz tube. Also during processing, a laser beam is transmitted below a top surface of the quartz tube. While the quartz tube is not sagging, the laser beam is detected with a detector. When the top surface of the quartz tube sags so that the laser beam is obstructed by the top surface, the laser beam is no longer detected by the detector. At this point the detector will alert an operator of the system that the top surface of the quartz tube is sagging so that the laser beam is obstructed by the top surface. The operator of the semiconductor diffusion furnace then may replace the quartz tube before damage is done to the semiconductor wafers.

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