Ink jet recording medium comprising amine-treated silica

Stock material or miscellaneous articles – Ink jet stock for printing – Particles present in ink receptive layer

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C428S032340

Reexamination Certificate

active

06861115

ABSTRACT:
This invention pertains to an ink jet recording medium comprises a flexible substrate and a coating composition coated on at least one surface of the substrate, wherein the coating composition comprises the product formed from the contact between fumed silica particles and at least one aminoorganosiloxane. The invention also pertains to a method for the preparation of such an ink jet recording medium and to methods for the preparation of a coating composition and a dispersion useful in the preparation of such an ink jet recording medium.

REFERENCES:
patent: RE30450 (1980-12-01), Iannicelli
patent: 4343857 (1982-08-01), Uram, Jr.
patent: 4522958 (1985-06-01), Das et al.
patent: 4618556 (1986-10-01), Takenouchi
patent: 4640882 (1987-02-01), Mitsuhashi et al.
patent: 4654284 (1987-03-01), Yu et al.
patent: RE32889 (1989-03-01), Litke
patent: 4816366 (1989-03-01), Hyosu et al.
patent: 4923520 (1990-05-01), Anzai et al.
patent: 5169441 (1992-12-01), Lauzon
patent: 5246624 (1993-09-01), Miller et al.
patent: 5304243 (1994-04-01), Yamaguchi et al.
patent: 5378566 (1995-01-01), Yu
patent: 5411787 (1995-05-01), Kulkarni et al.
patent: 5576088 (1996-11-01), Ogawa et al.
patent: 5660622 (1997-08-01), Nikoloff
patent: 5665156 (1997-09-01), Ettlinger et al.
patent: 5677067 (1997-10-01), Kojima et al.
patent: 5693127 (1997-12-01), Nigam et al.
patent: 5711797 (1998-01-01), Ettlinger et al.
patent: 5776240 (1998-07-01), Deller et al.
patent: 5851715 (1998-12-01), Barthel et al.
patent: 5856379 (1999-01-01), Shiratsuchi et al.
patent: 6001163 (1999-12-01), Havey et al.
patent: 6004899 (1999-12-01), Tachizawa
patent: 6096469 (2000-08-01), Anderson et al.
patent: 6129785 (2000-10-01), Schliesman et al.
patent: 6228475 (2001-05-01), Chu et al.
patent: 6284819 (2001-09-01), Darsillo et al.
patent: 6365264 (2002-04-01), Darsillo et al.
patent: 6380266 (2002-04-01), Katz et al.
patent: 6478861 (2002-11-01), Kwan et al.
patent: 20010014381 (2001-08-01), Kaneko et al.
patent: 20010016249 (2001-08-01), Kitamura et al.
patent: 20020040661 (2002-04-01), Glaum et al.
patent: 0 220 841 (1987-05-01), None
patent: 0 732 219 (1996-09-01), None
patent: 983 867 (2000-03-01), None
patent: 0 983 867 (2000-03-01), None
patent: 59 192589 (1984-10-01), None
patent: 60-224580 (1985-11-01), None
patent: 62 178384 (1987-08-01), None
patent: 1-019353 (1989-04-01), None
patent: 3-24905 (1991-04-01), None
patent: 11-165459 (1999-05-01), None
patent: 2001-010202 (2001-01-01), None
patent: WO 0001539 (2000-01-01), None
patent: WO 0105599 (2001-01-01), None
Lewis, ed.Pigment Handbook, p. 166, John Wiley & Sons, New York, 1988.
Degussa Product Information, “Experimental Product: Aerosil®R504, Aerosil 200 Aftertreated with Triethoxy-Propyl-Amino-Silane and Hexamethyl-Di-Silazane”(1996).
Degussa Product Brochure, Aerosil® Fumed Silica, pp. 1-32.
Degussa Product Brochure, Precipitated Silicas.
Degussa Technical Library, GP-126, “Degussa Synthetic Amorphous Silicas for Ink Jet Surfaces”.
Withiam, Michael C., “Silica Pigment Porosity Effects on Color Ink Jet Printablility,” IS&T's NIP12: International Conference on Digital Printing Technologies, pp. 409-417.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ink jet recording medium comprising amine-treated silica does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ink jet recording medium comprising amine-treated silica, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ink jet recording medium comprising amine-treated silica will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3449602

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.