Etching a substrate: processes – Forming or treating thermal ink jet article
Reexamination Certificate
2006-11-14
2006-11-14
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Forming or treating thermal ink jet article
C216S041000, C216S083000, C438S021000, C029S890100, C347S055000, C347S068000, C347S070000
Reexamination Certificate
active
07135121
ABSTRACT:
A manufacturing method of an ink-jet recording head for improving relative positional accuracy between a piezoelectric element and a pressure generating chamber to improve ink ejection characteristics and stability thereof. The manufacturing method includes the steps of: forming a passage-forming layer on a passage-forming substrate and imparting etching selectivity to a region that will be a space portion of the passage-forming layer; forming a vibration plate on the passage-forming layer and a piezoelectric element; performing anisotropic etching on the passage-forming substrate to form a penetrated portion at least to a region that will be the space portion, etching the passage-forming layer to form the space portion, and forming a pressure generating chamber opposite the space portion; and joining a nozzle plate to the passage-forming substrate.
REFERENCES:
patent: 4937597 (1990-06-01), Yasuhara et al.
patent: 6254223 (2001-07-01), Kim et al.
patent: 6401316 (2002-06-01), Kishima
patent: 6502930 (2003-01-01), Shimada et al.
patent: 6584708 (2003-07-01), Yun et al.
patent: 6851187 (2005-02-01), Kishima
patent: 2003/0011660 (2003-01-01), Nishi et al.
patent: 0 782 923 (1997-07-01), None
patent: 0 830 945 (1998-03-01), None
patent: 0 919 383 (1999-06-01), None
patent: 919383 (1999-06-01), None
patent: 0 963 846 (1999-12-01), None
patent: 963846 (1999-12-01), None
patent: 59098859 (1984-06-01), None
patent: 3-293141 (1991-12-01), None
patent: 5-286131 (1993-02-01), None
patent: 7-318417 (1995-12-01), None
patent: 8-298318 (1996-11-01), None
patent: 09156097 (1997-06-01), None
patent: 10286960 (1998-10-01), None
patent: 10337875 (1998-12-01), None
patent: 11227190 (1999-08-01), None
patent: 11291495 (1999-10-01), None
patent: WO 97/34769 (1997-09-01), None
Matsuzawa Akira
Shimada Masato
Takahashi Tetsushi
Ahmed Shamim
Seiko Epson Corporation
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