Etching a substrate: processes – Forming or treating thermal ink jet article
Patent
1997-03-10
1998-03-24
Powell, William
Etching a substrate: processes
Forming or treating thermal ink jet article
216 33, 216 49, 216 56, B41J 300
Patent
active
057308896
ABSTRACT:
A method of fabricating an ink jet recording head includes forming a photosensitive resin layer on a substrate having formed thereon an energy generation device for generating energy for ejecting recording droplets; pattern-wise exposing the photosensitive resin layer to an active radiation to a portion of the photosensitive resin layer where formation of a pattern of an ink fluid path is desired; laminating a top plate on the photosensitive resin layer; and eluting the pattern exposed portion of the photosensitive resin layer to form a pattern of an ink fluid path. An ink jet recording head includes a substrate a substrate; an energy generation device provided on the substrate and for generating energy for ejecting recording droplets; an exposed photosensitive resin layer provided on the substrate, the resin layer comprising a heat-crosslinking positive type resist material, and being provided with an ink fluid path defined between the substrate and the exposed photosensitive resin layer; a top plate laminated on the exposed photosensitive layer, the top plate being provided with an ink supply port communicating with the ink fluid path; and the ink fluid path ending as an ink ejection port on a side opposite to a side of the ink supply port. An ink jet recording apparatus includes a portion for mounting such an ink jet recording head.
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Eur. Pat. Off. Search Report for Eur. Pat. Appln. No. 93108683.9.
Inada Genji
Miyagawa Masashi
Ohkuma Norio
Canon Kabushiki Kaisha
Powell William
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