Etching a substrate: processes – Forming or treating thermal ink jet article
Reexamination Certificate
2005-09-13
2005-09-13
Alanko, Anita (Department: 1765)
Etching a substrate: processes
Forming or treating thermal ink jet article
C216S041000, C216S056000, C029S890100
Reexamination Certificate
active
06942815
ABSTRACT:
An ink jet recording head is capable of: preventing any of stagnation in ink flow, formation of vapor bubbles, cavitation, or like problems from occurring in the ink flow; realizing an excellent ink ejection operation, and thereby realizing a high quality gradation expression in recording; and, lessening a degree of a required accuracy both in dimension and in alignment of its components being stacked together. In a method for manufacturing the ink jet recording head provided with a pressure generating chamber, this chamber is constructed of a through-hole of a chamber plate and a pair of plates, between which plates the chamber plate is sandwiched. The processing step for forming this through-hole further comprises the sub-steps of: forming a first resist film and a second resist film on a first and a second surface of the chamber plate, respectively, wherein the resist films assume substantially a same shape, but are different in length from each other when measured in a direction parallel to a flow direction of ink; and, etching away both the first and the second surface of the chamber plate using the resist films as its masks so that the through-hole is formed in the chamber plate and serves as the pressure generating chamber.
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Alanko Anita
Fuji 'Xerox Co., Ltd.
McGinn & Gibb PLLC
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