Etching a substrate: processes – Forming or treating thermal ink jet article
Reexamination Certificate
2011-04-12
2011-04-12
Norton, Nadine G (Department: 1713)
Etching a substrate: processes
Forming or treating thermal ink jet article
C216S002000, C216S011000, C216S016000, C216S041000, C216S046000, C216S052000, C216S058000, C216S083000
Reexamination Certificate
active
07922922
ABSTRACT:
An object of this invention is to provide a manufacturing method that, by using a general-purpose semiconductor fabrication process, can easily manufacture an ink jet print head in which energy generating elements are complicatedly installed in the ink path. To this end, the present invention comprising steps of providing a substrate having a removal projected portion, forming an energy generating element along the projected portion, forming a supporting member on the energy generating element, and forming a ink chamber by removing the projected portion from the substrate.
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Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Norton Nadine G
Remavege Christopher M
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