Ink composition

Details Ink composition Ink composition

2006-05-17

2010-10-19

Koslow, C. Melissa (Department: 1793)

Compositions: coating or plastic

Coating or plastic compositions

Marking

C106S031130, C430S286100, C430S300000, C430S302000

Reexamination Certificate

active

07815724

ABSTRACT:
An ink composition containing an α-hetero atom-containing methacrylic compound represented by the following general formula (I) as a polymerizable compound and a polymerization initiator (b):wherein Raand Rbeach independently represent a hydrogen atom, a halogen atom, a cyano group or an organic group; X represents a group bonded to the α-carbon through a hetero atom, or a halogen atom; and Rcrepresents a secondary or tertiary hydrocarbon group having not less than7carbon atoms and including a ring structure, provided that X and Rc, Raand Rb, or X and Raor Rbmay be linked together to form a ring structure.

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patent: 2003-171420 (2003-06-01), None
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Takahashi. “Evaluation of chemically amplified resist based on adamantyl methacrylate for 193 nm lithography.” SPIE vol. 2438. pp. 422-432.
Tsuda. Thermally Stable Cyclopolymer from the Ether Dimer of Adamantyl alpha-Hydroxymethylacrylate. Macromolecules 1993, 26, pp. 4734-4735.

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