Injectivity profile in CO.sub.2 injection wells via ball sealers

Wells – Processes – Distinct – separate injection and producing wells

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Details

166268, 166284, E21B 33138, E21B 4316

Patent

active

047023180

ABSTRACT:
A method for diverting CO.sub.2 injection in injection wells by the use of perforation ball sealers composed of polymer compounds covered with a thin coating of elastomer of low enough density to float in the injected fluids, yet able to stand the adverse temperatures of CO.sub.2 injection.

REFERENCES:
patent: 3174546 (1965-03-01), Flickinger
patent: 3620304 (1971-11-01), Hearn et al.
patent: 3749171 (1973-07-01), Marx
patent: 3835928 (1974-09-01), Strubbar et al.
patent: 4102401 (1978-07-01), Erbstoesser
patent: 4244425 (1981-01-01), Erbstoesser
patent: 4287952 (1981-09-01), Erbstoesser
patent: 4407368 (1983-10-01), Erbstoesser
patent: 4410387 (1983-10-01), Halkerston et al.
patent: 4417620 (1983-11-01), Shafir
patent: 4489783 (1984-12-01), Shu
patent: 4505334 (1985-03-01), Doner et al.
patent: 4513821 (1985-04-01), Shu
patent: 4552216 (1985-11-01), Wilson
patent: 4565249 (1986-01-01), Pebdani et al.

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