Electric lamp or space discharge component or device manufacturi – Process – With assembly or disassembly
Reexamination Certificate
2000-03-10
2001-04-10
Ramsey, Kenneth J. (Department: 2879)
Electric lamp or space discharge component or device manufacturi
Process
With assembly or disassembly
C445S050000
Reexamination Certificate
active
06213837
ABSTRACT:
TECHNICAL FIELD
The present invention relates in general to a field emission electron source, and in particular, to a field emission display.
BACKGROUND INFORMATION
Compared to a microtip field emission cathode, a thin film field emission flat cathode, such as a carbon thin film cathode, requires a simpler structure, and is easier and less expensive to manufacture. One of the challenges in producing a viable field emission flat cathode is the production of an addressable cathode because of two reasons. First, the emission properties of an emitting film often severely degrade when exposed to most processes. As a result, once the film is deposited, the cathode cannot be easily processed for patterning or other purposes. Second, there is often severe edge emission from cathode feedlines.
An addressable field emission flat cathode typically consists of metal feedlines on an insulating substrate and a field emitting film, such as an emitting carbon film, on top of the feedlines. The edges of these metal feedlines or the emitting material on these edges often emit electrons dominantly and preferentially over the desired area, such as the pixel area, because of an enhanced electrical field on these edges. As a result, the emission pattern is completely disrupted. The emission from the cathode becomes unpredictable and unstable.
Therefore, there is a need in the art for a flat field emission cathode, which has inhibited or eliminated edge emission from the metal and the emitting material located at metal feedline edges while maintaining strong emission from desired areas.
SUMMARY OF THE INVENTION
Edge emission of the metal feedlines in a thin film field emission flat cathode can be inhibited or even eliminated by covering the metal edges with a dielectric film. The emission area can be defined by removing this dielectric film only on the desired area within the two edges of the metal lines before the deposition of an emitting carbon film, using a conventional photolithography process. A surface treatment can be further applied to the area to enhance growth and emission properties of the emitting film.
The foregoing has outlined rather broadly the features and technical advantages of the present invention in order that the detailed description of the invention that follows may be better understood. Additional features and advantages of the invention will be described hereinafter which form the subject of the claims of the invention.
REFERENCES:
patent: 5552659 (1996-09-01), Macaulay
patent: 5628659 (1997-05-01), Xie et al.
Kordzik Kelly K.
Ramsey Kenneth J.
SI Diamond Technology Inc.
Winstead Sechrest & Minick P.C.
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