Inhaler apparatus with modified surfaces for enhanced release of

Surgery – Respiratory method or device – Means for mixing treating agent with respiratory gas

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

12820312, A61M 1500

Patent

active

058710108

ABSTRACT:
In one aspect, the present invention provides an inhaler apparatus comprising interior surfaces having contact with a medicament for inhalation, the interior surfaces including an interior surface of a mouthpiece and a substrate with medicament deposited thereon at least one of such interior surfaces comprising indentations or raised areas therein, the raised areas having valleys therebetween. In certain preferred embodiments, the interior surface is a surface on a substrate having medicament deposited thereon, and in other preferred embodiments, the interior surface is an interior surface of the mouthpiece of the inhaler. In addition to providing surface topology for minimizing the area of contact between the medicament and the surfaces of the inhaler, the surfaces are preferably made of a material having a low surface energy, and more preferably, also having, when uncharged, no substantial van der Waals or electrostatic interaction with the medicament. Furthermore, the material is preferably substantially chemically unreactive with the medicament.

REFERENCES:
patent: 2603216 (1952-07-01), July
patent: 2604094 (1952-06-01), Miller et al.
patent: 3831606 (1974-08-01), Damani
patent: 3971377 (1976-07-01), Damani
patent: 4047525 (1977-09-01), Kulessa et al.
patent: 4069086 (1978-01-01), Reif
patent: 4072129 (1978-02-01), Bright et al.
patent: 4105027 (1978-08-01), Lundquist
patent: 4160257 (1979-07-01), Carrish
patent: 4197289 (1980-04-01), Sturzenegger et al.
patent: 4252848 (1981-02-01), Datta et al.
patent: 4332789 (1982-06-01), Mlodozeniec
patent: 4353365 (1982-10-01), Hallworth et al.
patent: 4570630 (1986-02-01), Elliott et al.
patent: 4627432 (1986-12-01), Newell et al.
patent: 4664107 (1987-05-01), Wass
patent: 4685620 (1987-08-01), Law et al.
patent: 4778054 (1988-10-01), Newell et al.
patent: 4795644 (1989-01-01), Zentner
patent: 4811731 (1989-03-01), Newell et al.
patent: 4889114 (1989-12-01), Kladders
patent: 4917978 (1990-04-01), Ritt et al.
patent: 4921727 (1990-05-01), Datta et al.
patent: 4921767 (1990-05-01), Datta et al.
patent: 4971257 (1990-11-01), Birge
patent: 5028501 (1991-07-01), Ritt et al.
patent: 5031610 (1991-07-01), Armstrong et al.
patent: 5035237 (1991-07-01), Newell et al.
patent: 5115803 (1992-05-01), Sioutas
patent: 5161524 (1992-11-01), Evans
patent: 5176132 (1993-01-01), Drought et al.
patent: 5239993 (1993-08-01), Evans
patent: 5243970 (1993-09-01), Ambrosio et al.
patent: 5263475 (1993-11-01), Altermatt et al.
patent: 5278588 (1994-01-01), Kubelik
patent: 5301666 (1994-04-01), Lerk et al.
patent: 5327883 (1994-07-01), Williams et al.
patent: 5415162 (1995-05-01), Casper et al.
patent: 5462701 (1995-10-01), Hagemeyer et al.
patent: 5507281 (1996-04-01), Kuhnel et al.
patent: 5512131 (1996-04-01), Kumar et al.
patent: 5619984 (1997-04-01), Hodson et al.
patent: 5652079 (1997-07-01), Mochizuki et al.
Donald A. Seanor, Triboelectrification of Polymers in K.C. Frisch and A. Patsis, Electrical Properties of Polymers (Technomic Pubcations, Westport, CT) p.p. 37-58.
Toshiya Watanabe et al., Electrostatic Force and Absorption Current of Alumina Electrostatic Chuck, Jpn. J. Appl. Phys. vol. 31, pp. 2145-2150 (1992).
Larry D. Harsough, Electrostatic Wafer Holding, Solid State Technology, pp. 87-90 (Jan. 1993).
John Field, Electrostatic Wafer Clamping for Next-Generation Manufacturing, Solid State Technology, pp. 91-98 (Sep. 1994).
J. -F. Daviet et al., Electrostatic Clamping Applied to Semiconductor Plasma Processing, I. Theoretical Modeling, J. Electrochem. Soc., vol. 140, No. 11, pp. 3245-3256 (Nov. 1993).
J. -F. Daviet et al., Electrostatic Clamping Applied to Semiconductor Plasma Processing, II. Experimental Results, J. Electrochem. Soc., vol. 140, No. 11, pp. 3256-3261 (Nov. 1993).
Peter Singer, Electrostatic Chucks in Wafer Processing, Semiconductor International, pp. 57-64 (Apr. 1995).
T. Watanabe et al., Electrostatic Charge Distribution in The Dielectric Layer of Alumina Electrostatic Chuck, Journal of Materials Science, vol. 29, pp. 3510-3616 (1994).
Mamoru Nakasuji et al., Low Voltage and High Speed Operating Electrostatic Wafer Chuck Using Sputtered Tantalum Oxide Membrane, J. Vac. Sci. Technol. A 12(5) pp. 2834-2839 (Sep./Oct. 1994).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Inhaler apparatus with modified surfaces for enhanced release of does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inhaler apparatus with modified surfaces for enhanced release of, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inhaler apparatus with modified surfaces for enhanced release of will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2055505

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.