InGaAsSbN photodiode arrays

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Light responsive structure

Reexamination Certificate

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C257S189000, C257SE31019

Reexamination Certificate

active

07915639

ABSTRACT:
Embodiments of detectors made using lattice matched photoabsorbing layers are disclosed. A photodiode apparatus in accordance with one or more embodiments of the present invention comprises an indium phosphide substrate, and a photoabsorbing region comprising at least an indium gallium arsenide antimonide nitride (InGaAsSbN) layer, wherein the InGaAsSbN layer has a thickness of at least 100 nanometers and is nominally lattice-matched to the indium phosphide substrate.

REFERENCES:
patent: 4032951 (1977-06-01), De Winter et al.
patent: 2006-278397 (2006-10-01), None
Fu et al., “Solid-source molecular-beam epitaxy growth of GaInNAsSb/InGaAs single quantum well on InP with photoluminescence peak wavelength at 2.04 um”, Journal of Vacuum Science Technology B vol. 22, No. 3, May/Jun. 2004 pp. 1463-1467.

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