Infrared sensor and method for producing same

Details Infrared sensor and method for producing same Infrared sensor and method for producing same

2008-11-05

2010-02-16

Porta, David P (Department: 2884)

Radiant energy

Invisible radiant energy responsive electric signalling

Infrared responsive

Reexamination Certificate

active

07663106

ABSTRACT:
An infrared sensor includes a first substrate made of a thermoelectric conversion material and a second substrate. The first substrate is supported by posts made of an electrode material while being spaced apart from the second substrate. A sensing electrode and lead portions connected thereto are provided on the first substrate. The sensing electrode and the lead portions are covered with an infrared-absorbing film. The posts are connected to the lead portions, and external terminal connection electrodes are connected to the posts.

REFERENCES:
patent: 5193911 (1993-03-01), Nix et al.
patent: 5962854 (1999-10-01), Endo
patent: 6326621 (2001-12-01), Kamada et al.
patent: 6432474 (2002-08-01), Nakanishi et al.
patent: 2002/0069909 (2002-06-01), Kubo
patent: 2004/0020918 (2004-02-01), Kakihara et al.
patent: 2004/0089854 (2004-05-01), Chen et al.
patent: 2005/0162043 (2005-07-01), Higuchi et al.
patent: 2006/0043297 (2006-03-01), Ouvrier-Buffet et al.
patent: 06-160177 (1994-06-01), None
patent: 06-194226 (1994-07-01), None
patent: 08094433 (1996-04-01), None
patent: 2002-270909 (2002-09-01), None
patent: 2004-239708 (2004-08-01), None
Official Communication issued in International Patent Application No. PCT/JP2007/058605, mailed on Jul. 24, 2007.

Affiliated with

Also associated with

Rating

Infrared sensor and method for producing same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Infrared sensor and method for producing same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Infrared sensor and method for producing same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4166992