Infrared sensitive photo diode

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357 16, 357 32, 357 61, H01L 2714

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active

044941331

ABSTRACT:
A photo diode formed by a substrate of Cd.sub.x Hg.sub.1-x Te covered with a layer of CdTe forming a p-n junction. The substrate may be p-type in which case the layer is n-type or vice versa. An array of photo diodes may be formed by covering the substrate with semi-insulating CdTe and forming islets of In on the CdTe. Heating causes In to diffuse into the CdTe doping it n-type. This results in regions of n-type CdTe surrounded by semi-insulating CdTe each region forming, with the substrate, a photo diode. The heating also causes diffusion between the Cd.sub.x Hg.sub.1-x Te and CdTe to give a graded heterostructure. Electrical connections are made to the substrate, and each n-type region. The n-type CdTe region may alternatively be formed by molecular beam epitaxial growth techniques using a beam of In dopant.

REFERENCES:
patent: 4132999 (1979-01-01), Maille et al.
patent: 4374678 (1983-02-01), Castro
patent: 4377904 (1983-03-01), Chapman et al.
Igras et al., "Investigation of Ion Implanted Graded Gap (CdHgTe) Photodiodes", Electron Technology, 10, 4, pp. 63-70.
Chu et al., "High-Performance Backside-Illuminated Hg.sub.78 Cd.sub.22 Te/CdTe (.lambda.Cd=10 .mu.m) Planar Diodes", Appl. Phys. Lett., 37, 5, Sep. 1, 1980, pp. 486-488.
Itoh et al., "HgCdTe Photoconductive Detector Arrays", Fujitsu Sci. & Tech. J., vol. 16, No. 3, Sep. 1980, pp. 151-165.
Verie et al., "Cd.sub.x Hg.sub.1-x Te Infrared Photovoltaic Detectors", Applied Physics Letters, vol. 10, No. 9, pp. 241-243, May 1, 1967.

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