Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product
Patent
1989-12-22
1991-01-15
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
430 19, 430346, 430270, 430945, 3461351, 428 64, G03C 1492, G03C 100, G03C 1100, B32B 302
Patent
active
049853490
ABSTRACT:
An information storage medium comprises a substrate and a recording layer formed on the substrate containing Te, Ge, C and H. The recording layer is formed by sputtering, with a Ge-Te alloy being used as a target and with a mixed gas of a noble gas and a hydrocarbon being used as a sputtering gas. The hydrocarbon content in the sputtering gas falls within a range of 3 to 35%. The composition of the target is Ge.sub.x Te.sub.100-x (where x is expressed by atomic %, and 5.ltoreq.x.ltoreq.20).
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patent: 4461807 (1984-07-01), Mori et al.
patent: 4499178 (1985-02-01), Wada et al.
patent: 4565772 (1986-01-01), Takeoka et al.
Matsubara Motonari
Ohkawa Kideki
Ozawa Norio
Kabushiki Kaisha Toshiba
Michl Paul R.
Pezzner Ashley I.
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