Inert gas curtain for a thermal processing furnace

Heating – Accessory means for holding – shielding or supporting work...

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118715, 118725, 432 11, F27D 700, F27B 1700

Patent

active

049501569

ABSTRACT:
A tube furnace used for high-temperature processing of semiconductor wafers employs an annular manifold around the opening of the furnace tube where the wafer boats enter and exit, and this manifold or collar has a number of gas outlets to produce a radially-inwardly directed curtain of inert gas, such as nitrogen, to provide a physical barrier to prevent ambient gas from entering the furnace tube when the tubular cantilever is removed for loading and unloading operations. The manifold may be of unitary construction or may be constructed in two half-cylindrical parts, with separate gas inlets for each, so that the manifold may be removed to allow cleaning or replacement of the furnace tube. A symmetrical scavenger box surrounds this end of the furnace tube, outward of the annular manifold, so the inert gas introduced by the manifold and any ambient gas are scavenged in a radially symmetric manner.

REFERENCES:
patent: 4037830 (1977-07-01), Poluzzi et al.
patent: 4484538 (1984-11-01), Sarkozy et al.
patent: 4529474 (1985-07-01), Fujiyama et al.
patent: 4543059 (1985-09-01), Whang et al.
patent: 4653428 (1987-03-01), Wilson et al.
patent: 4803948 (1989-02-01), Nakagawa et al.

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