Industrial vapor conveyance and deposition

Details Industrial vapor conveyance and deposition Industrial vapor conveyance and deposition

2005-09-13

2005-09-13

Hook, James (Department: 3752)

Pipes and tubular conduits

With flow regulators and/or baffles

Restrictors

C138S044000

Reexamination Certificate

active

06941973

ABSTRACT:
A process for deposition and condensation and reaction and separation and distillation employing at least two chambers separated by a diaphragm with at least one separation wall and at least one orifice or flow duct or plurality thereof. The new process includes (i) a condensation-free formation of a reservoir of an uncondensed phase under controlled flow conditions in front of a diaphragm, (ii) local pulse forces in an orifice or flow duct is controlled by local flow speed or local flow density or local flow pressure of said uncondensed phase to provide macroscopic control of an uncondensed intermediary and final phase or material and (iii) controlled conveyance and production rates under conditions of said local control and is independent from gravitational acceleration so orientation of individual modules or units or assembly of a production plant.

REFERENCES:
patent: 39820 (1863-09-01), Lunkenheimer
patent: 700205 (1902-05-01), Keller et al.
patent: 2378476 (1945-06-01), Guellich
patent: 3018799 (1962-01-01), Volkmann et al.
patent: 3104178 (1963-09-01), Da Silva
patent: 3805612 (1974-04-01), Shiba
patent: 4383423 (1983-05-01), Lenglet et al.
patent: 4401052 (1983-08-01), Baron et al.
patent: 4435199 (1984-03-01), Potkay
patent: 4534816 (1985-08-01), Chen et al.
patent: 4593446 (1986-06-01), Hayner
patent: 4947790 (1990-08-01), Gartner et al.
patent: 5093149 (1992-03-01), Doehler et al.
patent: 5356476 (1994-10-01), Foster et al.
patent: 5653806 (1997-08-01), Van Buskirk
patent: 5728222 (1998-03-01), Barbee et al.
patent: 5769388 (1998-06-01), Welker
patent: 5785089 (1998-07-01), Kuykendal et al.
patent: 6216741 (2001-04-01), Aarntzen
patent: 36 10 291 (1986-10-01), None
patent: 36 10 293 (1986-10-01), None
patent: 36 10 298 (1986-10-01), None
patent: 36 19 284 (1986-10-01), None
patent: 262 551 (1988-12-01), None
patent: 02-125866 (1990-05-01), None
patent: 440 428 (1986-09-01), None
Hagena et al., “Magnesium cluster-beam deposition on glass and Si(111),” Journal of Vacuum Science and Technology: Part A., vol. 12, No. 2, Mar. 1994, New York, pp. 282-298.
Database WPI, May 20, 1987, Derwent Publications, Ltd., London, GB; AN 87-134058, “Evaporator for printed circuit boards manufacture—has emitting diaphragm in middle part of steam duct with thermal screens on either side of it.”
Sax et al., Hawleys' Condensed Chemical Dictionary, 11thEd., Van Nostrand Reinhold, New York, 1987, p. 630.

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