Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to attribute – absence or presence of work
Reexamination Certificate
2007-09-18
2007-09-18
Koch, George (Department: 1734)
Coating apparatus
Control means responsive to a randomly occurring sensed...
Responsive to attribute, absence or presence of work
C118S698000, C118S702000, C118S703000, C427S009000, C427S010000, C427S008000, C347S005000, C347S009000, C347S010000, C347S011000
Reexamination Certificate
active
10479318
ABSTRACT:
A microdeposition system (20) and method deposits precise amounts of fluid material onto a substrate. A microdeposition head (50) includes a plurality of spaced nozzles. A positioning device controls a position of the microdeposition head relative to the substrate. A controller (22) includes a positioning module that communicates with the positioning device and that generates position control signals for the positioning device. A nozzle firing module communicates with the microdeposition head (50) and selectively generates nozzle firing commands to define features of at least one layer of an electrical device, such as resistors, traces and capacitors on a printed circuit board, polymer light emitting diodes, and light panels.
REFERENCES:
patent: 5498444 (1996-03-01), Hayes
patent: 5505777 (1996-04-01), Ciardella et al.
patent: 5681757 (1997-10-01), Hayes
patent: 5707684 (1998-01-01), Hayes et al.
patent: 5711989 (1998-01-01), Ciardella et al.
patent: 5779971 (1998-07-01), Tsung Pan et al.
patent: 5906682 (1999-05-01), Bouras et al.
patent: 5932012 (1999-08-01), Ishida et al.
patent: 5935375 (1999-08-01), Nakazawa et al.
patent: 6007631 (1999-12-01), Prentice et al.
patent: 6354686 (2002-03-01), Tanaka et al.
patent: 6517176 (2003-02-01), Chaug
International Search Report for PCT/US02/17523; ISA/US; Mailed: Sep. 20, 2002.
Albertalli David
Bielich Howard Walter
Bruner Scott R.
Edwards Charles O.
Middleton James
Harness & Dickey & Pierce P.L.C.
Koch George
Litrex Corporation
LandOfFree
Industrial microdeposition system for polymer light emitting... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Industrial microdeposition system for polymer light emitting..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Industrial microdeposition system for polymer light emitting... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3739746