Inductively coupled plasma spectrometer for process...

Optics: measuring and testing – By dispersed light spectroscopy – With sample excitation

Reexamination Certificate

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Reexamination Certificate

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06867859

ABSTRACT:
The present invention relates to an apparatus and method for forming a plasma in the exhaust line of a primary process reactor. The plasma is generated in an inductive source (5) to examine the chemical concentrations of the waste or exhaust gas in vacuum lines that are below atmospheric pressure. The optical radiation emitted by the plasma is analyzed by an optical spectrometer (9) and the resulting information is used to diagnose, monitor, or control operating states in the main vacuum vessel.

REFERENCES:
patent: 3648015 (1972-03-01), Fairbairn
patent: 3653766 (1972-04-01), Walters et al.
patent: 3958883 (1976-05-01), Turner
patent: 3984681 (1976-10-01), Fletcher et al.
patent: 4147431 (1979-04-01), Mann
patent: 4609426 (1986-09-01), Ogawa
patent: 4629887 (1986-12-01), Bernier
patent: 4847792 (1989-07-01), Barna et al.
patent: 4857136 (1989-08-01), Zajac
patent: 4859277 (1989-08-01), Barna et al.
patent: 5066125 (1991-11-01), Rogers et al.
patent: 5180949 (1993-01-01), Durr
patent: 5273610 (1993-12-01), Thomas, II et al.
patent: 5326975 (1994-07-01), Barna
patent: 5372783 (1994-12-01), Lackie
patent: 5383019 (1995-01-01), Farrell et al.
patent: 5529657 (1996-06-01), Ishii
patent: 5546322 (1996-08-01), Gifford et al.
patent: 5671045 (1997-09-01), Woskov et al.
patent: 5777735 (1998-07-01), Reagen
patent: 5857890 (1999-01-01), Ferran
patent: 5877032 (1999-03-01), Guinn et al.
patent: 5949193 (1999-09-01), Roine et al.
patent: 5963336 (1999-10-01), McAndrew et al.
patent: 5986747 (1999-11-01), Moran
patent: 6045618 (2000-04-01), Raoux et al.
patent: 6046796 (2000-04-01), Markle et al.
patent: 6068783 (2000-05-01), Szetsen
patent: 6075609 (2000-06-01), Tarkanic et al.
patent: 6101971 (2000-08-01), Denholm et al.
patent: 6120734 (2000-09-01), Lackie
patent: 6134005 (2000-10-01), Smith, Jr. et al.
patent: 6333269 (2001-12-01), Naito et al.
patent: 6381022 (2002-04-01), Zavracky
patent: 58084431 (1983-05-01), None
Danner et al. “Downstream Atomic Monitoring for Absolute Etch Rate Determinations” J. Electrochem. Soc: Solid-State Science and Technology Apr. 1983.
Lichtman Residual Gas Analysis: Past, Present and Future J. Vac. Sci. Technol. A 8 (3) May/Jun. 1990, 1990 American Vacuum Society.

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