Inductively coupled plasma alignment apparatus and method

Details Inductively coupled plasma alignment apparatus and method Inductively coupled plasma alignment apparatus and method

2007-09-25

2007-09-25

Van, Quang (Department: 3742)

Electric heating

Metal heating

By arc

C219S121510

Reexamination Certificate

active

11293336

ABSTRACT:
An inductively coupled plasma alignment apparatus having a coil10for generating an inductively coupled plasma in a gas, the coil having a first axis100; a torch20passing at least partially through the coil, the torch having a second axis200; and an adjustment mechanism80, 110for adjusting the position of the torch with respect to the coil so as to alter the relative configuration of the first and second axes. The adjustment mechanism may adjust an angle and/or a distance between the second axis and the first axis. The second axis may be held substantially parallel to the first axis, while the adjustment mechanism adjusts a distance between the second axis and the first axis. The coil is preferably maintained substantially fixed in position with respect to a sampling aperture for sampling photons or ions from the plasma.

REFERENCES:
patent: 4266113 (1981-05-01), Denton et al.
patent: 4293220 (1981-10-01), Denton et al.
patent: 4551609 (1985-11-01), Falk
patent: 4682026 (1987-07-01), Douglas
patent: 4766287 (1988-08-01), Morrisroe et al.
patent: 5185523 (1993-02-01), Kitagawa et al.
patent: 5334834 (1994-08-01), Ito et al.
patent: 2002/0100751 (2002-08-01), Carr
patent: 2004/0195218 (2004-10-01), Hiroaki et al.
patent: 0 910 231 (1999-04-01), None
patent: 968 472 (1964-09-01), None
patent: 02227653 (1990-09-01), None

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