Individually addressable cathodes with integrated focusing...

Radiant energy – With charged particle beam deflection or focussing – With target means

Reexamination Certificate

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C250S310000, C250S492200, C250S42300F

Reexamination Certificate

active

06917043

ABSTRACT:
Systems and method are described for addressable field emission array (AFEA) chips. A plurality of individually addressable cathodes are integrated with an electrostatic focusing stack and/or a plurality of detectors on the addressable field emission array. The systems and methods provide advantages including the avoidance of space-charge blow-up.

REFERENCES:
patent: 3665241 (1972-05-01), Spindt et al.
patent: 4090106 (1978-05-01), Okumura et al.
patent: 4130761 (1978-12-01), Matsuda
patent: 4409487 (1983-10-01), Kuschel et al.
patent: 4663559 (1987-05-01), Christensen
patent: 4724328 (1988-02-01), Lischke
patent: 4731537 (1988-03-01), Williams et al.
patent: 4742234 (1988-05-01), Feldman et al.
patent: 4798959 (1989-01-01), Marks
patent: 4902898 (1990-02-01), Jones et al.
patent: 4980567 (1990-12-01), Yasuda et al.
patent: 5015912 (1991-05-01), Spindt et al.
patent: 5126574 (1992-06-01), Gallagher
patent: 5138237 (1992-08-01), Kane et al.
patent: 5189306 (1993-02-01), Frei
patent: 5363021 (1994-11-01), MacDonald
patent: 5384463 (1995-01-01), Honjo et al.
patent: 5514847 (1996-05-01), Makishima et al.
patent: 5557106 (1996-09-01), Ioco
patent: 5723867 (1998-03-01), Imura
patent: 6522061 (2003-02-01), Lockwood
patent: 196 38 109 (1997-03-01), None
patent: 0 289 278 (1988-02-01), None
patent: 0 520 780 (1992-12-01), None
patent: 0 780 879 (1997-06-01), None
patent: 192682 (1995-07-01), None
Chang et al., “Electron beam technology SEM to microcolumn,”Microelec. Engin, 32:113-130, 1996.
Chang et al., “Electron-beam microcolumns for lithography and related applications,”J. Vac. Sci. Technol., 14: 3774-3781.
Shimazu, N. et al., “Electron Beam System EB60 Permits Fast Direct Drawing on Wafers”, JEE Journal of Electronic Engineering, vol. 23, No. 238, pp. 85-88, Oct. 1, 1986.
Chang, T. et al., “Arrayed miniature electron beam columns for high throughput sub-100nm lithography”, J. Vac. Sci. Technol., Part B, vol. 10, No. 6, pp. 2743-2748, Nov. 1992.
Stebler, C. et al., “Miniaturized e-Beam Writer: Testing of Components”, Microelectronic Engineering, vol. 27, No. 1/04, pp. 155-158, Feb. 1995.
T.H.P. Chang, et al, “Electron-beam Microcolumns for Lithography and Related Applications”, J. Vac. Sci. Technol. B 14(6), Nov./Dec. 1996, p. 3774-3780.
Lloyd R. Harriott, “Scattering With Angular Limitation Projection Electron Beam Lithography for Suboptical Lithography”, J. Vac. Sci. Technol. B 15(6), Nov./Dec. 1997, p. 2130-2135.
Scott Hector, et al., “X-ray Lithography for ≦100 nm Ground Rules in Complex Patterns”, J. Vac. Sci. Technol. B 15(6), Nov./Dec. 1997, p. 2517-2521.
J. Melngailis, “A Review of Ion Projection Lithography”, J. Vac. Sci. Technol. B 16(3), May/Jun. 1998, p. 927-957.
C.W. Gwyn, et al., “Extreme Ultraviolet Lithography”, J. Vac. Sci. Technol. B 16(6), Nov./Dec. 1998, p. 3142-3149.
M.A. Sturans, et al., “EL5: One Tool for Advanced X-ray and Chrome on Glass Mask Making”, J. Vac. Sci. Technol. B 16(6), Nov./Dec. 1998, p. 3164-3167.

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