Compositions: ceramic – Ceramic compositions – Titanate – zirconate – stannate – niobate – or tantalate or...
Reexamination Certificate
2004-12-24
2009-10-13
Group, Karl E (Department: 1793)
Compositions: ceramic
Ceramic compositions
Titanate, zirconate, stannate, niobate, or tantalate or...
C423S594900, C252S520100
Reexamination Certificate
active
07601661
ABSTRACT:
The invention provides an indium oxide-tin oxide powder which can be produced at low cost and which can provide a high-density sputtering target having a prolonged target life, and a sputtering target employing the powder. The indium oxide-tin oxide powder containing an In—Sn oxide as a predominant component is characterized in that the oxide powder contains no compound oxide (In4Sn3O12) detectable through X-ray diffraction and has a SnO2solid solution amount in In2O3of 2.3 mass % or more, the SnO2solid solution amount being calculated from the precipitated SnO2content (mass %) obtained from the ratio between integral diffraction intensity attributed to In2O3(222) and integral diffraction intensity attributed to SnO2(110).
REFERENCES:
patent: 5071800 (1991-12-01), Iwamoto et al.
patent: 5762768 (1998-06-01), Goy et al.
patent: 5866493 (1999-02-01), Lee et al.
patent: 6030507 (2000-02-01), Lupton et al.
patent: 6080341 (2000-06-01), Stenger et al.
patent: 6096285 (2000-08-01), Hayashi et al.
patent: 6099982 (2000-08-01), Okabe et al.
patent: 6500225 (2002-12-01), Hasegawa et al.
patent: 6936100 (2005-08-01), Tadakuma
patent: 7115219 (2006-10-01), Hattori et al.
patent: 7374743 (2008-05-01), Katusic et al.
patent: 19822570 (1999-07-01), None
patent: 62-21751 (1987-01-01), None
patent: 63199862 (1988-08-01), None
patent: 5-193939 (1993-08-01), None
patent: 6-191846 (1994-07-01), None
patent: 8-246140 (1996-09-01), None
patent: 8-246141 (1996-09-01), None
patent: 8-246142 (1996-09-01), None
patent: 9-221322 (1997-08-01), None
patent: 11-11946 (1999-01-01), None
patent: 11011946 (1999-01-01), None
patent: 2000-281337 (2000-10-01), None
patent: 2001-172018 (2001-06-01), None
patent: 2001-261336 (2001-09-01), None
patent: 2002-68744 (2002-03-01), None
Takahashi Seiichiro
Watanabe Hiroshi
Group Karl E
Mitsui Mining & Smelting Co. Ltd.
Sughrue & Mion, PLLC
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