Indirect plasmatron

Details Indirect plasmatron Indirect plasmatron

1997-12-19

1999-08-31

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

156345, 21912147, 21912148, 2191215, 21912152, H05H 100

Patent

active

059449012

ABSTRACT:
The indirect plasmatron comprises a neutrode assembly comprising a plurality of plate-shaped electrode members which are electrically insulated from each other. In its interior, the neutrode assembly defines an elongated plasma channel. The outlet aperture for the plasma torch is in the shape of an elongate slot and extends parallel to the central longitudinal axis of the plasma channel. Each of the two electrodes of the plasmatron is surrounded by a cavity through which an inert gas can be fed into the plasma channel. For the purpose of stabilizing the electric arc, at least one pair of permanent magnet members is provided. Their magnetic field exerts a force onto the electric arc which is directed opposite to the force exerted onto the electric arc by the flow of the plasma gas. Particular neutrodes are provided with a channel for feeding a further gas into the plasma channel.

REFERENCES:
patent: 4948485 (1990-08-01), Wallsten et al.
patent: 5239161 (1993-08-01), Lang

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