Index interferometric instrument including both a broad band and

Optics: measuring and testing – By polarized light examination – With birefringent element

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356357, 356360, G01B 902

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active

054165873

ABSTRACT:
The Index Interferometric Instrument is a highly accurate instrument which can be utilized to measure the index of refraction, the dispersion, and the index profile of materials. The instrument provides the data necessary to measure the index of refraction of materials to five significant figures. The index profile can be measured at any chosen wavelength without any sample preparation. The instrument utilizes a 10 nm to a 400 nm bandwidth light source and a light source with a bandwidth of less than 10 nm in combination with an interferometer. Each light source creates interference patterns from the sample and a reference mirror which can be used to accurately calculate the index of refraction of an entire sample at any given point on the sample.

REFERENCES:
patent: 5159408 (1992-10-01), Waldenmeir et al.
Diana Tentori and Carlos Lopez, "High-Accuracy Critical Angle Refractometry," Optical Engineering, Mar. 1993, pp. 593-601. Shows that there are methods to improve the accuracy of refractive measurements that use prisms.
Diana Tentori, "High-Precision Refractometry by Hologram and Interferometry," Optical Engineering Apr. 1992, pp. 805-808. Explains a method for using interference patterns to measure the refractive index of an optical glass sample in the form a wedge by comparisons with a reference liquid.
Diana Tentori and Jesus Lerma, "Refractometry by Minimum Deviation: Accuracy Analysis," Optical Engineering, Feb. 1992, pp. 160-168. Analyzes the accuracy achieved when evaluating high refractive indices by minimum deviation deflectometry.
Metricon Model 2010 Prism Computer 1991, (advertisement) Describes a device utilizing a prism and a laser beam that can be directed at different angles to obtain an optical propagation mode that can be used to determine the index of refraction and thickness of thin film.
Roger Johnston and W. Kevin Grace, "Refractive Index Detector Using Zeeman Interfermetry", Applied Optics, 1 Nov. 1990, pp. 4720-4724. Discusses the theory and error analysis for an ultrasensitive refractive index detector using a Zeeman effect laser.
R. W. Ditchburn, Light, 1976, pp. 332-337. Describes measuring refractive index with interferometers.
Alan Werner, "Methods in High Precision Refractometry of Optical Glasses," Applied Optics, May 1968, pp. 837-844. Describes five refractive methods and an interferomtric method for measuring refractive indices of optical glasses.
H. G. Jerrard, "Sources of Error in Ellipsometry," Proceeding of the Symposium on Recent Developments in Ellipsometry, 1968, pp. 67-87. Describes sources of error in ellipsometry.
G. E. Fishter, "Refractometry," Applied Optics and Optical Engineering (Kingslake), 1967, pp. 363-383. Background material on refractometry.
O. S. Heavens, Optical Properties of Thin Films, 1965, pp. 4-5, 96-131. Explores various methods for measuring film thickness.
Elio Passaglia, R. R. Stromberg, and J. Kruger eds., Ellipsometry in the Measurement of Thin Films, 1964, pp. 1, 34-39. Describes the optics of absorbing film on metal.
Leroy Tilton, "Testing and Accurate Use of Abbe-Type Refractometers," Journal of the Optical Society of America, Jul. 1942, pp. 371-381. Background material on refractometer.
H. W. Straat and J. W. Forrest, "The Accuracy Requirements in Fifth Place Refractometry," Jun. 1939, pp. 240-247. Background material on refractometers.
Jacques Ludman and Juanita Riccobono, "Index Interferometer," 20-1 Jul. 1992, Reprint from Optical Information Processing Systems and Architecture, pp. 258-264. This is the inventors article. The present application was filed less than one year after the publication and the presentation that this publication was based upon. Therefore, the publication is no considered prior art.

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