Indane compounds and compositions

Details Indane compounds and compositions Indane compounds and compositions

1991-12-20

1993-04-27

Reamer, James H.

Perfume compositions

Perfume compositions

Ring containing active ingredient

512 19, 560139, 568440, A61K 746

Patent

active

052062171

ABSTRACT:
The present invention relates to novel indane compounds, such as, for example, 5-formyl-1,1,2,3,3,4,6-heptamethylindane, a compound of the formula ##STR1## and to compositions including the same, as well as to methods for their preparation. Compounds and compositions of the invention possess a fragrant musk-like aroma and have utility in the perfumery and/or other industries.

REFERENCES:
patent: 3278622 (1966-10-01), Stofberg et al.
patent: 3509215 (1970-04-01), Wood et al.
patent: 3992432 (1976-11-01), Napier et al.
patent: 4018719 (1977-04-01), De Simone
patent: 4143065 (1979-03-01), Hoffmann et al.
patent: 4162256 (1979-07-01), Sprecker et al.
patent: 4352748 (1982-10-01), Traas et al.
patent: 4406828 (1983-09-01), Gonzenbach et al.
patent: 4466908 (1984-08-01), Sprecker et al.
patent: 4551573 (1985-11-01), Cobb
patent: 4568782 (1986-02-01), Pagnotta et al.
patent: 4806558 (1989-02-01), Wuest et al.
patent: 4994489 (1991-02-01), Wuest et al.
Fehr et al., Helvetica Chimica Acta, vol. 72, pp. 1537-1553 (1989).
French Patent No. 1,392,804 (as reported in Chemical Abstracts, vol. 63, p. 1681d (1965).
Kennedy, Carbocationic Polymerization, p. 221 (Wiley-Interscience Publishers, 1982).
Kondo et al., Synthesis, pp. 403-404 (May 1988).
Organic Synthesis, Collective vol. 5, pp. 49-50 (John Wiley & Sons, 1973).
Carey et al., Advanced Organic Chemistry, Part B, pp. 383-386 (Plenum Press, NY 1977).
British Patent No. 796,129 (as reported in Chemical Abstracts, vol. 53, p. 6190 (1958).
U.S. Pat. No. 2,851,501 (as reported in Chemical Abstracts, vol. 53, p. 6190-6191 (1958).

Affiliated with

Also associated with

Rating

Indane compounds and compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Indane compounds and compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Indane compounds and compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2327034