Increasing pulse-to-pulse radiation beam uniformity

Details Increasing pulse-to-pulse radiation beam uniformity Increasing pulse-to-pulse radiation beam uniformity

2006-11-14

2008-11-18

Rutledge, Della J. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C372S050220, C372S057000

Reexamination Certificate

active

07453551

ABSTRACT:
A system is used to substantially reduce divergence of a beam traveling between master and power oscillators, for example in a laser beam source. The system comprises the first and second oscillators and a beam conditioning device. The first oscillator is configured to generate a radiation beam. The beam conditioning device is configured to stabilize a position, a direction, a size, or a divergence of the radiation beam to produce a conditioned beam. The second oscillator configured to amplify the conditioned beam to produce an amplified beam.

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