Increased-contrast film for high-transmittance attenuated...

Details Increased-contrast film for high-transmittance attenuated... Increased-contrast film for high-transmittance attenuated...

2005-02-22

2005-02-22

Mohamedulla, Saleha R. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06858353

ABSTRACT:
An increased-contrast film for high-transmittance attenuated phase-shift masks (PSM's) is disclosed. A high-transmittance attenuated PSM includes a clear substrate, a shifter film selectively covering the clear substrate, and an increased-contrast film covering the shifter film to aid inspection of the PSM. The increased-contrast film may be removable, and may be photoresist. The increased-contrast film is preferably non-reactive to light used during the inspection of the PSM.

REFERENCES:
patent: 6641959 (2003-11-01), Yan

Affiliated with

Also associated with

Rating

Increased-contrast film for high-transmittance attenuated... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Increased-contrast film for high-transmittance attenuated..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Increased-contrast film for high-transmittance attenuated... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3499697