Incident-light phase grid and method for making same

Details Incident-light phase grid and method for making same Incident-light phase grid and method for making same

1985-03-27

1987-11-24

Arnold, Bruce Y.

350320, G02B 518

Patent

active

047084375

ABSTRACT:
In a process for forming an incident-light phase grid for a photoelectric positioning apparatus, a transparent substrate supports a first structured reflecting layer which is created by a photolithographic process by a first photolacquer layer exposed through an exposure mask. A whole surface thick spacer layer is applied to the structure carrying side of the substrate, and a second structured reflecting layer is formed on the spacer layer by photolithographic methods, including a second photolacquer layer which is exposed through the structured reflecting layer acting as an exposure mask.

REFERENCES:
Dreigitterschrittgeber Dissertation by Dipl.-Ing. Jorg Willhelm, Jun. 23, 1941, (1978), pp. 19-20.

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