Measuring and testing – Gas analysis – Solid content of gas
Patent
1998-05-14
1999-10-26
Williams, Hezron
Measuring and testing
Gas analysis
Solid content of gas
73 2403, 7386382, 7386352, G01N 1506, G01N 3700
Patent
active
059707810
ABSTRACT:
The mass of particulate of an effluent gas flowing in a stack is directly measured with a mass measurement assembly supported within the stack. The mass measurement assembly preferably includes an inertial mass measurement transducer which provides near real-time mass readings. The mass measurement assembly also includes a particulate collector which can be equilibrated in situ. A conditioned gas line supplies clean, dry, heated conditioned gas to the collector for equilibration. The flow rate of the conditioned gas prevents effluent gas from reaching the collector during equilibration. The collector can be equilibrated in the stack before and after sampling and between intermittent sampling periods.
REFERENCES:
patent: 3005347 (1961-10-01), Smithson
patent: 3068694 (1962-12-01), Worswick
patent: 3633405 (1972-01-01), Noll
patent: 3707869 (1973-01-01), Raynor
patent: 3926271 (1975-12-01), Patashnick
patent: 4114557 (1978-09-01), De Brey
patent: 4189937 (1980-02-01), Nelson
patent: 4391338 (1983-07-01), Patashnick
patent: 4660408 (1987-04-01), Lewis
patent: 4815314 (1989-03-01), Plank
patent: 5006227 (1991-04-01), Behm et al.
patent: 5090233 (1992-02-01), Kogure et al.
patent: 5369981 (1994-12-01), Merz et al.
patent: 5571946 (1996-11-01), Koshi et al.
patent: 5665902 (1997-09-01), Wang et al.
patent: 5739413 (1998-04-01), Kohn et al.
Hiss, III John
Patashnick Harvey
Rupprecht & Patashnick Company, Inc.
Wiggins J. David
Williams Hezron
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