In-situ wide area vacuum ultraviolet lamp

Details In-situ wide area vacuum ultraviolet lamp In-situ wide area vacuum ultraviolet lamp

1986-02-07

1988-11-01

Boudreau, Leo H.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

118 501, 118620, 118723, 427 39, 31323131, 313637, 31323161, 3133621, 204164, 315358, C23C 1308, B05D 306

Patent

active

047822678

ABSTRACT:
An open wide area vacuum ultraviolet lamp for use in microelectronics processing applications employes a ring-shaped cold cathode to produce a trapped electron beam discharge of generally disc-shaped cross section in a low pressure molecular gas environment and without the use of VUV windows.

REFERENCES:
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patent: 4145635 (1979-03-01), Tuck
patent: 4336277 (1982-06-01), Bunshah et al.
patent: 4340837 (1982-07-01), Meyer
patent: 4509451 (1985-04-01), Collins et al.
patent: 4560880 (1985-12-01), Petric et al.
patent: 4583023 (1986-04-01), Friedman et al.
patent: 4608063 (1986-08-01), Kurokawa
patent: 4620913 (1986-11-01), Bergman
patent: 4657774 (1987-04-01), Satou et al.
Desilets, "Plasma Etching Chamber," 12/1983, IBM Technical Disclosure Bulletin, vol. 26, No. 7B, pp. 3567-3569.

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