In-situ sizing of photolithographic mask or the like, and frame

Electric heating – Heating devices – With heater-unit housing – casing – or support means

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219200, 33614, 101481, 430 22, 430 5, H05B 306

Patent

active

056267843

ABSTRACT:
Alignment of a mask, such as a photolithographic mask, to a workpiece, such as a printed circuit board is improved using a frame having sides that are individually thermally expandable. The mask is fabricated to be undersized so that the distance between fiducials on the mask is less than a desired distance, which may be the distance between corresponding fiducials on the workpiece. The mask is mounted on the frame, whereafter at least one side of the frame is heated to expand the side and stretch the mask to achieve the desired interfiducial distance.

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Tamarack scientific co., inc., "Mask Alignment & Exposure System" advertising brochure undated.
C.A. Picard Inc., "Accuracy made easy" advertising brochure undated.

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