In-situ real-time sheet resistance measurement method

Details In-situ real-time sheet resistance measurement method In-situ real-time sheet resistance measurement method

1991-08-30

1993-02-09

Arbes, Carl J.

Metal working

Method of mechanical manufacture

Electrical device making

269 8, 361239, H01R 4300

Patent

active

051843986

ABSTRACT:
A system 20 for measuring the sheet resistance of a conductive layer on the top surface of a semiconductor wafer 22 is disclosed herein. In one embodiment, the system includes a chuck 30 electrically coupled to the backside surface of the wafer 22. The chuck 30 is capable of supporting the wafer 22 electrostatically. A signal source 40 provides an excitation signal to the wafer 22 and circuitry for monitoring an induced signal is provided. The sheet resistance on the top surface of the wafer 22 is determined from the measurements of the excitation and induced electrical signals. Other systems and methods are also disclosed.

REFERENCES:
patent: 4502094 (1985-02-01), Lewin et al.
patent: 4554611 (1985-11-01), Lewin
patent: 4665463 (1987-05-01), Ward et al.
patent: 4724510 (1988-02-01), Wickes et al.
patent: 4962441 (1990-10-01), Collins
patent: 5001594 (1991-03-01), Bobbio
patent: 5055964 (1991-10-01), Logan et al.

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