In situ real time particle monitor for a sputter coater chamber

Details In situ real time particle monitor for a sputter coater chamber In situ real time particle monitor for a sputter coater chamber

1993-04-01

1994-09-13

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

356343, G01N 1506

Patent

active

053471385

ABSTRACT:
A structure and a method use a non-invasive particle monitor to detect particles in a process chamber for a "down sputtering" metal deposition process. In one embodiment, only non-spherical particles are detected using a single laser beam of a predetermined polarization is used, and the phase shift in the polarization due to the passing of a particle through the laser beam is measured. In another embodiment, two closely spaced orthogonally polarized laser beams are used, and the differential intensity of the laser beams is measured when a particle passes through one of the laser beams. In another embodiment, shield tubes for housing optical components are used to prevent coating of the optical components and to prevent deposition to take place outside the shielded area. Internal electric and magnetic fields are used to drive particles through the laser beams for particle detection.

REFERENCES:
patent: 4707133 (1987-11-01), Roberts et al.
patent: 5061070 (1991-10-01), Batchelder et al.

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