In-situ polishing pad flatness control

Details In-situ polishing pad flatness control In-situ polishing pad flatness control

1995-06-02

1999-02-09

Rose, Robert A.

Abrading

Abrading process

Glass or stone abrading

451443, B24B 722, B24B 5300

Patent

active

058686053

ABSTRACT:
Conditioning of a polishing pad so as to control the surface profile and achieve uniformity in wear of a polishing pad by causing the workpiece and polishing pad to oscillate radially relative to one another with the extent of the oscillating movement being sufficient so that the workpiece extends over the edges of the polishing pad.

REFERENCES:
patent: 3699722 (1972-10-01), Davidson et al.
patent: 4239567 (1980-12-01), Winings
patent: 5081796 (1992-01-01), Schultz
patent: 5154021 (1992-10-01), Bombardier et al.
patent: 5177908 (1993-01-01), Tuttle
patent: 5234867 (1993-08-01), Schultz et al.
patent: 5329734 (1994-07-01), Yu
patent: 5394655 (1995-03-01), Allen et al.
patent: 5421789 (1995-06-01), Schultz et al.
patent: 5435772 (1995-07-01), Yu
patent: 5605499 (1997-02-01), Sugiyama et al.

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