In-situ plasma cleaning device for cylindrical surfaces

Details In-situ plasma cleaning device for cylindrical surfaces In-situ plasma cleaning device for cylindrical surfaces

2008-01-22

2008-01-22

McDonald, Rodney G. (Department: 1753)

Cleaning and liquid contact with solids

Apparatus

For work having hollows or passages

C134S001000, C134S001100, C134S104200, C134S12200P, C156S345420, C156S345460, C156S345490, C204S298210, C204S298220, C204S298310, C204S298370

Reexamination Certificate

active

07320331

ABSTRACT:
An in-situ plasma cleaning device (PCD) performs an atomic surface cleaning process to remove contaminants and/or to modify the cylindrical surfaces of both the target and substrate. The atomic cleaning process utilizes a plasma generated locally within the in-situ plasma cleaning device with suitable properties to clean both the target and substrate cylindrical surfaces either concurrently or separately. Moreover, the in-situ plasma cleaning device is designed to traverse the length of the target and the substrate cylindrical surfaces during the cleaning process.

REFERENCES:
patent: 4031424 (1977-06-01), Penfold et al.

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