In-situ pellicle monitor

Details In-situ pellicle monitor In-situ pellicle monitor

2006-06-13

2006-06-13

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000, C430S022000, C382S144000, C382S145000

Reexamination Certificate

active

07060403

ABSTRACT:
A mask structure and method of quantitatively measuring pellicle degradation in production photomasks by measuring overlay in test structures on the mask. A structure is located in a high transmission region close to a transition region between a low transmission and a high transmission region of the mask such that pellicle degradation impacts the printing of the object. A second structure is located in low transmission region such that the printing of the second structure overlaps the first and provides a measure of pellicle degradation.

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