In-situ monitoring of the change in thickness of films

Details In-situ monitoring of the change in thickness of films In-situ monitoring of the change in thickness of films

1995-04-10

1996-09-24

Tokar, Michael

Electricity: measuring and testing

Determining nonelectric properties by measuring electric...

Semiconductors for nonelectrical property

324671, G01R 2700

Patent

active

055594280

ABSTRACT:
The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are induced in the film by a generating an alternating electromagnetic field with a sensor which includes a capacitor and an inductor.

REFERENCES:
patent: 2572908 (1951-10-01), Brenholdt
patent: 2916694 (1959-12-01), Hanysz et al.
patent: 3064184 (1962-11-01), Watkiss
patent: 3077858 (1963-02-01), Ulug
patent: 3381217 (1968-04-01), Williamson et al.
patent: 3450985 (1969-06-01), Lorenzi et al.
patent: 3473110 (1969-10-01), Hardin et al.
patent: 3626344 (1971-12-01), Shaternikov et al.
patent: 3878457 (1975-04-01), Rodgers
patent: 3996510 (1976-12-01), Guichard
patent: 4197676 (1980-04-01), Sauerland
patent: 4328462 (1982-05-01), Jensen
patent: 4556845 (1985-12-01), Strope et al.
patent: 4715007 (1987-12-01), Fijita et al.
patent: 4793895 (1988-12-01), Kaanta et al.
patent: 4992135 (1991-02-01), Doan
patent: 5017869 (1991-05-01), Oliver
patent: 5081421 (1992-01-01), Miller et al.
patent: 5132617 (1992-07-01), Leach et al.
patent: 5213655 (1993-05-01), Leach et al.
patent: 5222329 (1993-06-01), Yu
patent: 5241280 (1993-08-01), Aidun et al.
patent: 5242524 (1993-09-01), Leach et al.
patent: 5308438 (1994-05-01), Cote et al.
patent: 5337015 (1994-08-01), Lustig et al.
patent: 5416411 (1995-05-01), Elsmore
"Detecting Undesired Breaks in Metal Ladders" by F. J. Soychak, IBM Techanical Disclosure Bulletin, vol. 9, No. 4, Sep. 1966, pp. 358-359.

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