In-situ monitoring of conductive films on semiconductor wafers

Details In-situ monitoring of conductive films on semiconductor wafers In-situ monitoring of conductive films on semiconductor wafers

1995-04-10

1997-08-26

Strecker, Gerard R.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

324 715, 324230, 324234, H01L 21302, G01B 706

Patent

active

056606729

ABSTRACT:
The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are induced in the film by a generating an alternating electromagnetic field with a sensor which includes a capacitor and an inductor.

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