In-situ monitoring and feedback control of metalorganic precurso

Details In-situ monitoring and feedback control of metalorganic precurso In-situ monitoring and feedback control of metalorganic precurso

1995-10-06

1997-07-29

Hannaher, Constantine

Radiant energy

Invisible radiant energy responsive electric signalling

Ultraviolet light responsive means

117 86, H01L 2120

Patent

active

056524315

ABSTRACT:
The in-situ monitoring of metalorganic precursor delivery in a metalorganic chemical vapor deposition oxide system in high temperature super conductors (HTSC) film growth is accomplished by utilizing the distinct absorbance bands for metalorganic compounds. As an ultraviolet-visible light beam is passed through an effluent metalorganic gas stream the relative change in ultraviolet-visible absorbance of the ultraviolet-visible light beam passing through the effluent metalorganic gas stream is monitored. Stoichiometry control is achieved by feeding back absorbance data to a controlling parameter such as carrier gas mass flow rate, thus stabilizing fluctuations in source concentration in the bubble effluent from a computer or similar monitoring device. Such an apparatus and method improves the stoichiometry control of mixed metal oxide film deposition and increases the manufacturability of thin films.

REFERENCES:
patent: 4601582 (1986-07-01), Casey, Jr.
patent: 5070246 (1991-12-01), Durham et al.
Hebnel et al., "In Situ Measurement of the Metalorganic and Hydride Partial ressres in a MOCVD Reactor Using Ultraviolet Absorbtion Spectroscopy", J. of Cry. Growth, vol. 98, pp. 293-301, 1989 no month.

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