In-situ magnetron assisted DC plasma etching apparatus and metho

Details In-situ magnetron assisted DC plasma etching apparatus and metho In-situ magnetron assisted DC plasma etching apparatus and metho

1998-04-06

2000-08-01

Gulakowski, Randy

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

20419212, 2041922, 20419232, 204156, 216 22, C25F 302

Patent

active

060951605

ABSTRACT:
A method for cleaning the surface of magnetic disks prior to the deposition of a metal layer on the magnetic disk. The method includes the steps of first, placing a magnetic disk into a magnetron assisted DC plasma chamber. The plasma chamber includes a vacuum chamber, one or more targets, one or more magnets, a noble gas source, a target power supply, and a DC bias power supply. Next, a noble gas, for example argon, is introduced into the vacuum chamber via the noble gas source, and a DC glow discharge is generated in the vacuum chamber by supplying power to the one or more targets using the target power supply. Finally, the magnetic disk is etched when a negative voltage is applied to the magnetic disk using the DC bias power supply.

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