In situ low energy ion doping of materials grown by CVD

Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation

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427529, 427528, 427527, 427523, 427569, 427577, 427596, B05D 306, C23C 1600

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053545842

ABSTRACT:
A material growing by deposition is exposed to a low energy beam of ionized dopant. The ion beam energy is sufficient to implant the dopant in the growing surface of the material. This doping method will work well for any dopant that is substantially immobile in the material at the temperature necessary for deposition growth.

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