In-situ endpoint control apparatus for semiconductor wafer polis

Details In-situ endpoint control apparatus for semiconductor wafer polis In-situ endpoint control apparatus for semiconductor wafer polis

1997-02-14

1999-02-02

Eley, Timothy V.

Abrading

Precision device or process - or with condition responsive...

Computer controlled

451 6, 451 7, 451290, 451285, B24B 4900, B24B 5100

Patent

active

058656650

ABSTRACT:
Endpoint determination of a wafer removal process, in-situ, is afforded by the use of a Kalman filter known to be useful in celestial navigation. The use of line variable displacement transducers provides position error correction for the Kalman filter and the Preston equation provides the initial calibration for the endpoint determination. Accuracies of fifty angstrom are achieved.

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