In situ determination of resistivity, mobility and dopant...

Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters

Reexamination Certificate

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C324S071500, C438S017000, C438S018000

Reexamination Certificate

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07078919

ABSTRACT:
The present invention provides techniques for an in-situ measurement of resistivity profiles and dopant concentration distributions in semiconductor structures, such as shallow junctions. A substrate with a resistor test structure having a conduction circuit may be placed at a measurement station, surface layers may be successively removed from the conduction circuit at the measurement station, a sheet resistance of the conduction circuit may be measured at the measurement station after the removal of each surface layer to generate a plurality of sheet resistance measurements, and the resistivity profile may be calculated from the plurality of sheet resistance measurements.

REFERENCES:
patent: 3554891 (1971-01-01), Duffy et al.
patent: 3660250 (1972-05-01), Duffy et al.
patent: 4303482 (1981-12-01), Buhne et al.
patent: 5217907 (1993-06-01), Bulucea et al.
patent: 6087189 (2000-07-01), Huang
patent: 2005/0124085 (2005-06-01), Andoh et al.
patent: 2 281 402 (1995-03-01), None
L.J. van der Pauw, “A Method Of Measuring Specific Resistivity And Hall Effect Of Discs Of Arbitrary Shape”, Philips Res. Repts. 13, pp. 1-9, 1958.
Eileen Tannenbaum, “Detailed Analysis Of Thin Phosphorus-Diffused Layers In p-Type Silicon”, Solid Sate Electronics, vol. 2, pp. 123-132, 1961.
R. Galloni et al., “Fully Automatic Apparatus For The Determination Of Doping Profiles In Si By Electrical Measurements And Anodic Stripping”, Rev. Sci. Instrum., vol. 54, No. 3, pp. 369-373, Mar. 1983.
A. Bartels et al., “A Procedure For Temperature-Dependent, Differential Van Der Pauw Measurements”, Rev. Sci. Instrum., vol. 66, No. 8, pp. 4271-4276, Aug. 1995.
G. Queirolo, et al., “Incremental sheet resistance and spreading resistance: A comparison”, J. Vac. Sci. Technol. B., vol. 10, No. 1, pp. 408-412, Jan./Feb. 1992.
Susan B. Felch, et al., “A Comparison of Three Techniques for Profiling Ultrashallow p+-n Junctions”, Solid State Technology, vol. 36, No. 1, pp. 45-51, Jan. 1993.
Min-Soo Kim, et al., “In-situ Monitoring of Anodic Oxidation of p-type Si(100) by Electrochemical Impedance Techniques in Nonaqueous and Aqueous Solutions”, Bull. Korean Chem. Soc., vol. 20, No. 9, pp. 1049-1055, Sep. 1999.
Yoshio Kikuchi, et al., “Quantitative Ultra Shallow Dopant Profile Measurement By Scanning Capacitance Microscope”, Fujitsu Sci. Tech. J., vol. 38, No. 1, pp. 75-81, Jun. 2002.
Joseph Plunkett et al., “A computer algorithm for accurate and repeatable profile analysis using anodization and stripping of silicon”, Sol. St. Electr., vol. 20, p. 447-453 (1977).
Ryosaku Komatsu et al., “Novel Automatic measuring system for resistivity profiles in silicon wafers”, Jap. J. of Appl. Phys., vol. 9, p. 169-173 (1980).
N.D. Young and M.J. Hight, “Automatic Hall effect profiler for electrical characterization”, Electronic Letters, vol. 21, p. 1044-1046 (1985).
L.Bours and D.Tsoukalas, “Determination of doping and mobility profiles by automatic electrical measurement and anodic stripping”, J. Phys. E. Sci. Instruments, vol. 20, p. 541-544 (1987).
S.R. Blight et al., “Automated Hall profiling system for the characterization of semiconductors at room and liquid nitrogen temperature”, J. Phys. E. Sci. Instrum., vol. 21, p. 470-479 (1988).
T. Alzanki, et al., “Differential Hall effect profiling of ultrashallow junctions in Sb implanted silicon”, Appl. Phys. Lett., vol. 85, No. 11, Sep. 13, 2004, p. 1979-1980.
S.R. Blight et al., “Automated Hall profiling system for the characterization of semiconductors at room and liquid nitrogen temperature”, J. Phys. E. Sci. Instrum., vol. 21, p. 470-479 (1988).
L. Bouro and D. Tsoukalas, “Determination of doping and mobility profiles by automatic electrical measurement and anodic stripping”, J. Phys. E. Sci. Instruments, vol. 20, p. 541-544 (1987).
Ryosaku Komatsu et al., “Novel Automatic measuring system for resistivity profiles in silicon wafers”, Jap. J. of Appl. Phys., vol. 9, p. 169-173 (1980).
Joseph Plunkett et al., “A computer algorithm for accurate and repeatable profile analysis using anodization and stripping of silicon”, sol. St. Electr., vol. 20, p. 447-453 (1977).
N.D. Young and M.J. Hight, “Automatic Hall effect profiler for electrical characterization”, Electronic Letters, vol. 21, No. 22, p. 1044-4046 (1985).

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