In-situ defect monitor and control system for immersion...

Details In-situ defect monitor and control system for immersion... In-situ defect monitor and control system for immersion...

2007-05-29

2007-05-29

Nguyen, Tu T. (Department: 2886)

Optics: measuring and testing

By particle light scattering

With photocell detection

Reexamination Certificate

active

10858759

ABSTRACT:
A system and method for detecting bubbles in a lithographic immersion medium and for controlling a lithographic process based at least in part on the detection of bubbles is provided. A bubble monitoring component emits an incident beam that passes through the immersion medium and is incident upon a substrate to produce a reflected and/or diffracted beam(s). The reflected and/or diffracted beam(s) is received by one or more optical detectors. The presence or absence of bubbles can be derived from information extracted by scatterometry from the reflected and/or diffracted beams. A process control component interacts with a positioning component and an optical exposure component to alter a lithographic process based at least in part on the results of the scatterometry.

REFERENCES:
patent: 2004/0238481 (2004-12-01), Wang et al.

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